Description du projet

JBX-8100FS

Présentation

The JBX-8100FS is an electron beam lithography system featuring a spot beam, Vector scan, and a step and repeat stage. Capable of varying the beam size widely, the system is versatile in its applications from basic research of elements to test production of optical elements to research and development for masks for high accelerating voltage exposure. Its dynamic correction system eliminates defocusing resulting from beam deflection.